研究発表論文

Author(s)TitleJournalVol.(Year)Page/Article no.
Rajib, A;Karim, M.E.;Kurosu, S;Ukai, T;Tokuda, M;Fujii, Y;Hanajiri,T;Ishikawa, R; Ueno, K; Shirai, HSynthesis of AlOx thin films by atmospheric-pressure mist chemical vapor deposition for surface passivation and electrical insulator layersJournal of Vacuum Science & Technology A38(2020)033413
Ishikawa, R; Ueno, K; Shirai, HImproved efficiency of methylammonium-free perovskite thin film solar cells by fluorinated ammonium iodide treatmentOrganic Electronics78(2020)105596
Moriya, Y; Ishikawa, R; Akiyama, S; Ueno, K; Shirai, HSelf-assembled Fluorinated Polymer Passivation Layer for Efficient Perovskite Thin-film Solar CellsChemistry Letters49(2020)87-90
Kawamura, K;Ishikawa, R;Wasai, Y; Nabatova-Gabain,N; Kurosu, S; Ukai, T; Tokuda, M; Fujii, Y; Hanajiri,T; Ueno, K; Shirai, HRole of the solvent in large crystal grain growth of inorganic-organic halide FA0.8Cs0.2PbIxBr3-x perovskite thin films monitored by ellipsometryJournal of Vacuum Science & Technology B37(2019)062401
Islam,A.T.M.S.; Karim, M.E.; Rajib, A; Nasuno, Y; Ukai, T;Kurosu, S; Tokuda,M;Fujii, Y; Nakajima, Y;Hanajiri,T; Shirai, HChemical mist deposition of organic for efficient front- and back-PEDOT:PSS/crystalline Si heterojunction solar cellsApplied Physics Letters 114(2019)193901
Ishikawa, R; Ueno, K; Shirai, HHighly crystalline large-grained perovskite films using two additives without an antisolvent for high-efficiency solar cellsThin Solid Films679(2019)27-34
Ishikawa, R; Ueno, K; Shirai, HFabrication of [CH(NH2)(2)](0.8)Cs0.2PbI3 Perovskite Thin Films for n-i-p Planar-structure Solar Cells by a One-step Method Using 1-Cyclohexyl-2-pyrrolidone as an AdditiveCHEMISTRY LETTERS47(2018)905
Numata, Y; Sanehira, Y; Ishikawa, R; Shirai, H; Miyasaka, TThiocyanate Containing Two-Dimensional Cesium Lead Iodide Perovskite, Cs2PbI2(SCN)(2): Characterization, Photovoltaic Application, and Degradation MechanismACS APPLIED MATERIALS & INTERFACES10(2018)42363
Kasahara, K; Hossain, J; Harada, D; Ichikawa, K; Ishikawa, R; Shirai, HCrystalline-Si heterojunction with organic thin-layer (HOT) solar cell module using poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS)SOLAR ENERGY MATERIALS AND SOLAR CELLS181(2018)60
Numata, Y; Ishikawa, R; Sanehira, Y; Kogo, A; Shirai, H; Miyasaka, TNb-doped amorphous titanium oxide compact layer for formamidinium-based high efficiency perovskite solar cells by low-temperature fabricationJOURNAL OF MATERIALS CHEMISTRY A6(2018)9583
Hossain, J; Kasahara, K; Harada, D;Islam, ATMS; Ishikawa, R; Ueno, K ; Hanajiri, T; Nakajima, Y; Fujii, Y; Tokuda, M; Shirai, HBarium hydroxide hole blocking layer for front- and back-organic/crystalline Si heterojunction solar cellsJOURNAL OF APPLIED PHYSICS122(2017)055101
Ishikawa, R; Ueno, K; Shirai, HFabrication of {CH(NH2)(2)}(1-x)CsxPbI3 Perovskite Thin Films by Two-step Method and Its Application to Thin Film Solar CellsCHEMISTRY LETTERS46(2017)612
Hossain, J; Liu, QM; Miura, T; Kasahara, K; Harada, D; Ishikawa, R; Ueno, K ; Shirai, HNafion-Modified PEDOT:PSS as a Transparent Hole-Transporting Layer for High-Performance Crystalline-Si/Organic Heterojunction Solar Cells with Improved Light Soaking StabilityACS Applied Materials & Interfaces8(2016)31926
Yamanaka, T; Masumori, K;Ishikawa, R; Ueno, K; Shirai, HRole of Isopropyl Alcohol Solvent in the Synthesis of Organic-Inorganic Halide CH(NH2)(2)PbIxBr3-x Perovskite Thin Films by a Two-Step MethodJOURNAL OF PHYSICAL CHEMISTRY C120(2016)25371
Liu, QM; Ishikawa, R; Funada, S; Ohki, T; Ueno, K; Shirai, HHighly Efficient Solution-Processed Poly(3,4-ethylenedio-xythiophene):Poly(styrenesulfonate)/Crystalline-Silicon Heterojunction Solar Cells with Improved Light-Induced StabilityADVANCED ENERGY MATERIALS5(2015)1500744
Liu, QM; Ohki, T; Liu, DQ; Sugawara, H; Ishikawa, R; Ueno, K; Shirai, HEfficient organic/polycrystalline silicon hybrid solar cellsNANO ENERGY11(2015)260
Khatri, I; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HSelf assembled siliver nanowire mesh as top electrode for organic-inorganic hybrid solar cellCANADIAN JOURNAL OF PHYSICS92(2014)867
Khatri, I; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HImproved photovoltaic response by incorporating green tea modified multiwalled carbon nanotubes in organic-inorganic hybrid solar cellCANADIAN JOURNAL OF PHYSICS92(2014)849
Shirai, H; Ueno, KSolution-processed graphene oxide as a possible material for photovoltaic deviceTHE JOURNAL OF THE INSTITUTE OF ELECTRONICS, INFORMATION, AND COMMUNICATION ENGINEERS97(2014)215
Tang, Z; Liu, Q; Chen, Q; Khatri, I; Shirai, HPlasmonic-enhanced crystalline silicon/organic heterojunction cells by incorporating gold nanoparticlesPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE211(2014)1179
Hiate, T; Miyauchi, N; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HReal-time measurement of optical anisotropy during film growth using a chemical mist deposition of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)JOURNAL OF APPLIED PHYSICS115(2014)123514
Khatri, I; Hoshino, A; Watanabe, F; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HSelf-assembled silver nanowires as top electrode for poly(3,4-ethylenedioxythiophene):poly(stylenesulfonate)/n-silicon solar cellTHIN SOLID FILMS558(2014)306
Kishi, M; Kubo, Y; Ishikawa, R; Shirai, H; Ueno, KEfficient Organic Photovoltaic Cells Using MoO3 Hole-Transporting Layers Prepared by Simple Spin-Cast of Its Dispersion Solution in MethanolJAPANESE JOURNAL OF APPLIED PHYSICS52(2013)020202
Khatri, I; Tang, Z; Hiate, T; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HOptical and carrier transport properties of graphene oxide based crystalline-Si/organic Schottky junction solar cellsJOURNAL OF APPLIED PHYSICS114(2013)234506
Liu, Q; Khatri, I; Ishikawa, R; Fujimori, A; Ueno, K; Manabe, K; Nishino, H; Shirai, HImproved photovoltaic performance of crystalline-Si/organic Schottky junction solar cells using ferroelectric polymersAPPLIED PHYSICS LETTERS103(2013)163503
Liu, Q; Imamura T; Hiate, T; Khatri, I; Tang, Z; Ishikawa, R; Ueno, K; Shirai, HOptical anisotropy in solvent-modified poly(3,4-ethylenedioxythiophene):poly(styrenesulfonic acid) and its effect on the photovoltaic performance of crystalline silicon/organic heterojunction solar cellsAPPLIED PHYSICS LETTERS102(2013)243902
Liu, Q; Khatri, I; Ishikawa, R; Ueno, K; Shirai, HEffects of molybdenum oxide molecular doping on the chemical structure of poly(3,4-ethylenedioxythiophene):poly(stylenesulfonate) and on carrier collection efficiency of silicon/poly(3,4-ethylenedioxythiophene):poly(stylenesulfonate) heterojunction solar cellsAPPLIED PHYSICS LETTERS102(2013)183503
Chen, Q; Shirai, HLarge-Area Cold Atmospheric Pressure Discharges Realized by Mesh Covered Tube-Plate Electrodes in Open AirIEEE TRANSACTIONS ON PLASMA SCIENCE41(2013)421
Khatri, I; Tang, Z; Liu, Q; Ishikawa, R; Ueno, K; Shirai, HGreen-tea modified multiwalled carbon nanotubes for efficient poly(3,4-ethylenedioxythiophene):poly(stylenesulfonate)/n-silicon hybrid solar cellAPPLIED PHYSICS LETTERS102(2013)063508
Ishikawa, R; Shirai, H; Ueno, KIncreased Organic Photovoltaic Cell Efficiency by Incorporating a Nonionic Fluorinated Surfactant Cathode InterlayerAPPLIED PHYSICS EXPRESS5(2012)121601
Hiate, T; Ino, T; Ishikawa, R; Ueno, K; Shirai, HElectrospray-Deposited Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonate) for Poly(3-hexylthiophene):Phenyl-C-61-Butyric Acid Methyl Ester Photovoltaic CellsJAPANESE JOURNAL OF APPLIED PHYSICS51(2012)10NE30
Liu, QM; Wanatabe, F; Hoshino, A; Ishikawa, R; Gotou, T; Ueno, K; Shirai, HCrystalline Silicon/Graphene Oxide Hybrid Junction Solar CellsJAPANESE JOURNAL OF APPLIED PHYSICS51(2012)10NE22
Chen, Q; Shirai, HDiagnostics of atmospheric pressure microplasma with a liquid electrodeEUROPEAN PHYSICAL JOURNAL D66(2012)161
Ino, T; Ono, M; Miyauchi, N; Liu, QM; Tang, ZG; Ishikawa, R; Ueno, K; Shirai, HElectrospray Deposition of Poly(3-hexylthiophene) Films for Crystalline Silicon/Organic Hybrid Junction Solar CellsJAPANESE JOURNAL OF APPLIED PHYSICS51(2012)61602
Liu, QM; Ono, M; Tang, ZG; Ishikawa, R; Ueno, K; Shirai, HHighly efficient crystalline silicon/Zonyl fluorosurfactant-treated organic heterojunction solar cellsAPPLIED PHYSICS LETTERS100(2012)183901
Watanabe, F; Shirai, H; Fujii, Y; Hanajiri, TRapid thermal annealing of sputter-deposited ZnO/ZnO:N/ZnO multilayered structuresTHIN SOLID FILMS520(2012)3729
Ono, M; Tang, ZG; Ishikawa, R; Gotou, T; Ueno, K; Shirai, HEfficient Crystalline Si/Poly(ethylene dioxythiophene): Poly(styrene sulfonate): Graphene Oxide Composite Heterojunction Solar CellsAPPLIED PHYSICS EXPRESS5(2012)32301
Fukuda, T; Takagi, K; Asano, T; Honda, Z; Kamata, N; Shirai, H; Ju, J; Yamagata, Y; Tajima, YImproved Power Conversion Efficiency of Organic Photovoltaic Cell Fabricated by Electrospray Deposition Method by Mixing Different SolventsJAPANESE JOURNAL OF APPLIED PHYSICS51(2012)02BK12
Ino, T; Asano, T; Fukuda, T; Ueno, K; Shirai, HReal-Time Ellipsometric Characterization of Initial Growth Stage of Poly(3,4-ethylene dioxythiophene):Poly(styrene sulfonic acid) Films by Electrospray DepositionJAPANESE JOURNAL OF APPLIED PHYSICS50(2011)81603
Ino, T; Hayashi, T; Ueno, K; Shirai, HDepth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic EllipsometryJAPANESE JOURNAL OF APPLIED PHYSICS50(2011)08JG02
Morita, A; Watanabe, I; Ohta, N; Shirai, HChemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film GrowthJAPANESE JOURNAL OF APPLIED PHYSICS50(2011)08JD02
Fukuda, T; Takagi, K; Asano, T; Honda, Z; Kamata, N; Ueno, K; Shirai, H; Ju, J; Yamagata, Y; Tajima, YBulk heterojunction organic photovoltaic cell fabricated by the electrospray deposition method using mixed organic solventPHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS5(2011)229
Kato, S; Ishikawa, R; Kubo, Y; Shirai, H; Ueno, KEfficient Organic Photovoltaic Cells Using Hole-Transporting MoO3 Buffer Layers Converted from Solution-Processed MoS2 FilmsJAPANESE JOURNAL OF APPLIED PHYSICS50(2011)71604
Ding, Y; Shirai, H; He, DYWhite light emission and electrical properties of silicon oxycarbide-based metal-oxide-semiconductor diodeTHIN SOLID FILMS519(2011)2513
Ohba, D; Lai, CH; Tang, ZG; Shirai, HSurface Chemistry of Preferentially (111)- and (220)-Crystal-Oriented Microcrystalline Silicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor DepositionJAPANESE JOURNAL OF APPLIED PHYSICS49(2010)81402
Jie, J; Morita, A; Shirai, HRole of oxygen atoms in the growth of magnetron sputter-deposited ZnO filmsJOURNAL OF APPLIED PHYSICS108(2010)33521
Ohta, N; Imamura, T; Shimizu, H; Kobayashi, T; Shirai, HReal time monitoring of the crystallization process during the plasma annealing of amorphous siliconPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE207(2010)574
Saha, JK; Ohse, N; Hamada, K; Matsui, H; Kobayashi, T; Jia, HJ; Shirai, HFast deposition of microcrystalline Si films from SiH2Cl2 using a high-density microwave plasma source for Si thin-film solar cellsSOLAR ENERGY MATERIALS AND SOLAR CELLS94(2010)524
Ding, Y; He, DY; Shirai, HDeposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jetJOURNAL OF PHYSICS D-APPLIED PHYSICS42(2009)125503
Ding, Y; Shirai, HWhite light emission from silicon oxycarbide films prepared by using atmospheric pressure microplasma jetJOURNAL OF APPLIED PHYSICS105(2009)43515
Chen, Q; Li, J; Saito, K; Shirai, HThe characterization of radio-frequency discharge using electrolyte solution as one electrode at atmospheric pressureJOURNAL OF PHYSICS D-APPLIED PHYSICS41(2008)175212
Li, JS; Wang, JX; Yin, M; Gao, PQ; He, DY; Chen, Q; Li, YL; Shirai, HDeposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor depositionJOURNAL OF APPLIED PHYSICS103(2008)43505
Li, JS; Wang, JX; Yin, M; Gao, PQ; He, DY; Chen, Q; Li, YL; Shirai, HStudy on the initial growth process of crystalline silicon films on aluminum-coated polyethylene napthalate by Raman spectroscopyJOURNAL OF CRYSTAL GROWTH308(2007)330
Li, JS; Wang, JX; Yin, M; Gao, PQ; He, DY; Chen, Q; Shirai, HDeposition and field emission properties of highly crystallized silicon films on aluminum-coated polyethylene napthalateJOURNAL OF CRYSTAL GROWTH306(2007)1
Saha, JK; Ohse, N; Hamada, K; Haruta, K; Kobayashi, T; Ishikawa, T; Takemura, Y; Shirai, HSynthesis of microcrystalline silicon films using high-density microwave plasma source from dichlorosilaneJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS46(2007)L696
Jia, HJ; Saha, JK; Ohse, N; Shirai, HHigh-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasmaTHIN SOLID FILMS515(2007)6713
Jia, H; Shirai, H; Kondo, MControl of the gas phase and the surface reactions during the high rate synthesis of high quality microcrystalline silicon films: Effects of the source gas supply method and the substrate biasJOURNAL OF APPLIED PHYSICS101(2007)114912
Shirai, H; Sakurai, Y; Yeo, M; Kobayashi, T; Ishikawa, TRapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressureEUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS37(2007)315
Shirai, H; Saito, T; Li, Y; Matsui, H; Kobayashi, TSurface chemistry and preferential crystal orientation on the H and Cl terminated silicon surfaceJOURNAL OF APPLIED PHYSICS101(2007)33531
Jia, HJ; Saha, JK; Ohse, N; Shirai, HEffect of substrate bias on high-rate synthesis of microcrystalline silicon films using a high-density microwave SiH4/H2 plasmaJOURNAL OF PHYSICS D-APPLIED PHYSICS39(2006)3844
Hasegawa, Y; Ishikawa, Y; Saso, T; Shirai, H; Morita, H; Komine, T; Nakamura, HA method for analysis of carrier density and mobility in polycrystalline bismuthPHYSICA B-CONDENSED MATTER382(2006)140
Jia, H; Saha, JK; Ohse, N; Shirai, HHigh-density microwave plasma of SiH4/H2 for high rate growth of highly crystallized microcrystalline silicon filmsEUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS33(2006)153
Jia, HJ; Saha, JK; Shirai, HPlasma parameters for fast deposition of highly crystallized microcrystalline silicon films using high-density microwave plasmaJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS45(2006)666
Hasegawa, Y; Ishikawa, Y; Shirai, H; Morita, H; Kurokouchi, A; Wada, K; Komine, T; Nakamura, HReduction of contact resistance at terminations of bismuth wire arraysREVIEW OF SCIENTIFIC INSTRUMENTS76(2005)113902
Shirai, H; Kobayashi, T; Hasegawa, YSynthesis of silicon nanocones using rf microplasma at atmospheric pressureAPPLIED PHYSICS LETTERS87(2005)143112
Yang, Z; Kikuchi, T; Hatou, Y; Kobayashi, T; Shirai, HCarbon microstructures synthesized utilizing the RF microplasma jet at atmospheric pressureJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS44(2005)4122
Hasegawa, Y; Ishikawa, Y; Morita, H; Komine, T; Shirai, H; Nakamura, HElectronic transport properties of a bismuth microwire array in a magnetic fieldJOURNAL OF APPLIED PHYSICS97(2005)83907
Shirai, H; Kikuchi, T; Kobayashi, TSynthesis of well-aligned carbon nanotubes using a high-density RF inductive coupling plasmaJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS44(2005)1951
Jia, H; Shirai, HCharacterization of microcrystalline silicon film growth on ZnO : Al using the high-density microwave plasmaJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS44(2005)837
Suzuki, A; Hasegawa, Y; Ishikawa, Y; Komine, T; Morita, H; Shirai, HInvestigation of physical and electric properties of silver pastes as a binder for thermoelectric materialsREVIEW OF SCIENTIFIC INSTRUMENTS76(2005)23907
Sakurai, Y; Kobayashi, T; Hasegawa, Y; Shirai, HRF microplasma jet at atmospheric pressure: Application to rapid recrystallization of amorphous siliconJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS44(2005)L749
Jia, HJ; Nakajima, M; Nakao, A; Shirai, HEffects of chamber wall heating and quartz window on fast deposition of microcrystalline silicon films by high-density microwave plasmaJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS43(2004)7960
Ikeda, Y; Ito, T; Li, YL; Yamazaki, M; Hasegawa, Y; Shirai, HSynthesis of novel p-type nanocrystalline Si prepared from SiH2Cl2 and SiCl4 for window layer of thin film Si solar cellJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS43(2004)5960
Hasegawa, Y; Ishikawa, Y; Komine, T; Huber, TE; Suzuki, A; Morita, H; Shirai, HMagneto-Seebeck coefficient of a bismuth microwire array in a magnetic fieldAPPLIED PHYSICS LETTERS85(2004)917
Kikuchi, T; Hasegawa, Y; Shirai, HRf microplasma jet at atmospheric pressure: characterization and application to thin film processingJOURNAL OF PHYSICS D-APPLIED PHYSICS37(2004)1537
Hasegawa, Y; Komine, T; Ishikawa, Y; Suzuki, A; Shirai, HNumerical calculation of magneto-seebeck coefficient of bismuth under a magnetic fieldJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS43(2004)35
Kurosaki, K; Hashimoto, K; Nakao, A; Shirai, HPhotoluminescence and optical characterizations of nanocrystalline silicon dots formed by plasma-enhanced chemical vapor depositionJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS42(2003)6296
Ito, T; Hashimoto, K; Shirai, HSurface chemistry of Si : H : Cl film formation by RF plasma-enhanced chemical vapor deposition of SiH2Cl2 and SiCl4JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS42(2003)L1119
Shirai, H; Seri, Y; Jia, H; Kurosaki, KNanocrystalline silicon dots fabricated by pulse RF plasma-enhanced chemical vapor deposition of SiCl4-and-H2 mixtureJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS42(2003)L1191
Hashimoto, K; Shirai, HFormation of Si : H : Cl films at low temperatures of 90-140 degrees C by RF plasma-enhanced chemical vapor deposition of a SiH2Cl2 and H2 mixtureJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS42(2003)1173
Yoshino, K; Ohkawara, G; Ueyama, H; Shirai, HMicrocrystalline silicon film growth using a high-density microwave plasma of SiH4-and-D2 mixtureJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS41(2002)7307
Shirai, H; Fujimura, YPhotoluminesence properties of nanocrystalline Si dots fabricated by RF plasma-enhanced chemical vapor deposition of SiCl4 and H2 mixtureJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS41(2002)L1161
Jung, SH; Fujimura, Y; Ito, T; Shirai, HChemistry of the chlorine-terminated surface for low-temperature growth of crystal silicon films by RF plasma-enhanced chemical vapor depositionSOLAR ENERGY MATERIALS AND SOLAR CELLS74(2002)421
Yoshino, K; Ohkawara, G; Ueyama, H; Shirai, HFast deposition of microcrystalline silicon films with preferred (220) crystallographic texture using the high-density microwave plasmaSOLAR ENERGY MATERIALS AND SOLAR CELLS74(2002)505
Fujimura, Y; Jung, S; Shirai, HFormation of self-assembled nanocrystalline silicon dots by SiCl4/H2 RF plasma-enhanced chemical vapor depositionJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS40(2001)L1214
Shirai, H; Yoshino, K; Ohkawara, G; Ueyama, HNovel high-density microwave plasma utilizing an internal spoke antenna for fast deposition of microcrystalline silicon filmsJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS40(2001)L701
Liu, HP; Jung, SH; Fujimura, Y; Toyoshima, Y; Shirai, HGrowth of crystal silicon films from chlorinated silanes by RF plasma-enhanced chemical vapor depositionJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS40(2001)L215
Shirai, H; Sakuma, Y; Yoshino, K; Ueyama, HSpatial distribution of high-density microwave plasma for fast deposition of microcrystalline silicon filmSOLAR ENERGY MATERIALS AND SOLAR CELLS66(2001)137
Liu, HP; Jung, SG; Fujimura, Y; Fukai, C; Shirai, H; Toyoshima, YLow-temperature plasma-enahanced chemical vapor deposition of crystal silicon film from dichlorosilaneJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS40(2001)44
Azuma, K; Inaba, H; Tasaka, K; Shirai, HStructural study of ultrathin hydrogenated amorphous carbon films using spectroscopic ellipsometry and ultraviolet Raman spectroscopyJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS39(2000)6705
Azuma, K; Inaba, H; Tasaka, K; Fujimaki, S; Shirai, HControl of plasma parameters for high-quality hydrogenated amorphous carbon growthJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS39(2000)6427
Shirai, H; Sakuma, Y; Yoshino, K; Ueyama, HSpatial distribution of the high-density microwave plasma and its effect on crystal silicon film growthJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS39(2000)L782
Shirai, H; Sakuma, Y; Moriya, Y; Fukai, C; Ueyama, HFast deposition of microcrystalline silicon using high-density SiH4 microwave plasmaJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS38(1999)6629
Shirai, H; Fukuda, Y; Nakamura, T; Azuma, KEffect of GeF4 addition on the growth of hydrogenated microcrystalline silicon film by plasma-enhanced chemical vapor depositionTHIN SOLID FILMS350(1999)38
Fukai, C; Moriya, Y; Nakamura, T; Shirai, HEnhanced crystallinity at initial growth stage of microcrystalline silicon on Corning #7059 glass using SiH2Cl2JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS38(1999)L554
Shirai, H; Sakuma, Y; Ueyama, HThe control of the high-density microwave plasma for large-area electronicsTHIN SOLID FILMS337(1999)12
Shirai, H; Arai, T; Ueyama, HThe generation of high-density microwave plasma and its application to large-area microcrystalline silicon thin film formationJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS37(1998)L1078
Arai, T; Shirai, HStudy of effect of SiH4 gas heating during growth of hydrogenated microcrystalline silicon on SiO2 by plasma-enhanced chemical-vapor depositionJOURNAL OF APPLIED PHYSICS80(1996)4976
Arai, T; Nakamura, T; Shirai, HInitial stage of microcrystalline silicon growth by plasma-enhanced chemical vapor depositionJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS35(1996)L1161
Arai, T; Shirai, HRole of SiH4 gas heating in the growth of hydrogenated microcrystalline siliconJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS35(1996)L676
SHIRAI, HSURFACE-MORPHOLOGY AND CRYSTALLITE SIZE DURING GROWTH OF HYDROGENATED MICROCRYSTALLINE SILICON BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITIONJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS34(1995)450